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Muestra
Ficha Técnica
Descripción

Advances in Imaging and Electron Physics, Volume 203, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. It features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

  • Contains contributions from leading authorities on the subject matter
  • Informs and updates on all the latest developments in the field of imaging and electron physics
  • Provides practitioners interested in microscopy, optics, image processing, mathematical morphology, electromagnetic fields, electron, and ion emission with a valuable resource
  • Features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing

1. Cover image - p. iv 2. Title page - p. iv 3. Table of Contents - p. iv 4. Copyright - p. iv 5. Contributors - p. ix 6. Preface - p. xi 7. Future Contributions - p. xiii 8. Chapter One: Convolution in (max⁡,min⁡)-Algebra and Its Role in Mathematical Morphology - p. xv 9. Chapter Two: Critical Magnetic Field and Its Slope, Specific Heat, and Gap for Superconductivity as Modified by Nanoscopic Disorder - p. 66 10. Chapter 3: Mirror Electron Microscopy - p. 97 11. Index - p. 193

Descripcion
Descripción

Advances in Imaging and Electron Physics, Volume 203, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. It features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

  • Contains contributions from leading authorities on the subject matter
  • Informs and updates on all the latest developments in the field of imaging and electron physics
  • Provides practitioners interested in microscopy, optics, image processing, mathematical morphology, electromagnetic fields, electron, and ion emission with a valuable resource
  • Features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing

1. Cover image - p. iv 2. Title page - p. iv 3. Table of Contents - p. iv 4. Copyright - p. iv 5. Contributors - p. ix 6. Preface - p. xi 7. Future Contributions - p. xiii 8. Chapter One: Convolution in (max⁡,min⁡)-Algebra and Its Role in Mathematical Morphology - p. xv 9. Chapter Two: Critical Magnetic Field and Its Slope, Specific Heat, and Gap for Superconductivity as Modified by Nanoscopic Disorder - p. 66 10. Chapter 3: Mirror Electron Microscopy - p. 97 11. Index - p. 193

Indice
Autores
Muestra
Ficha Técnica