Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering.
1. Laser Annealing Processes in Semiconductor Technology - p. Page i 2. Cover - p. Page i 3. Front Matter - p. Page i 4. Table of Contents - p. Page iii 5. Copyright - p. Page iv 6. Contributors - p. Page iv 7. Preface - p. Page v 8. List of Illustrations - p. Page viii 9. List of Tables - p. Page ix 10. Chapter 1 : Historical evolution of pulsed laser annealing for semiconductor processing - p. Page ix 11. Chapter 2 : Laser-matter interactions - p. Page 44 12. Chapter 3 : Atomistic modeling of laser-related phenomena - p. Page 75 13. Chapter 4 : Laser annealing applications for semiconductor devices manufacturing - p. Page 123 14. Chapter 5 : Materials science issues related to the fabrication of highly doped junctions by laser annealing of Group IV semiconductors - p. Page 167 15. Chapter 6 : Continuum modeling and TCAD simulations of laser-related phenomena in CMOS applications - p. Page 232 16. Chapter 7 : Laser engineering of carbon materials for optoelectronic applications - p. Page 288 17. Chapter 8 : Optical hyperdoping - p. Page 318 18. Chapter 9 : Laser ultra-doped silicon: Superconductivity and applications - p. Page 350 19. Index - p. Page 396
Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering.
1. Laser Annealing Processes in Semiconductor Technology - p. Page i 2. Cover - p. Page i 3. Front Matter - p. Page i 4. Table of Contents - p. Page iii 5. Copyright - p. Page iv 6. Contributors - p. Page iv 7. Preface - p. Page v 8. List of Illustrations - p. Page viii 9. List of Tables - p. Page ix 10. Chapter 1 : Historical evolution of pulsed laser annealing for semiconductor processing - p. Page ix 11. Chapter 2 : Laser-matter interactions - p. Page 44 12. Chapter 3 : Atomistic modeling of laser-related phenomena - p. Page 75 13. Chapter 4 : Laser annealing applications for semiconductor devices manufacturing - p. Page 123 14. Chapter 5 : Materials science issues related to the fabrication of highly doped junctions by laser annealing of Group IV semiconductors - p. Page 167 15. Chapter 6 : Continuum modeling and TCAD simulations of laser-related phenomena in CMOS applications - p. Page 232 16. Chapter 7 : Laser engineering of carbon materials for optoelectronic applications - p. Page 288 17. Chapter 8 : Optical hyperdoping - p. Page 318 18. Chapter 9 : Laser ultra-doped silicon: Superconductivity and applications - p. Page 350 19. Index - p. Page 396
