Nanolithography and Surface Microscopy with Electron Beams, Volume 231 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Specific chapters cover Introduction to inverse problems in electron microscopy, Directional sinogram inpainting for limited angle tomography, Strain tomography of crystals, FISTA with adaptive discretization, Total variation discretization, and Reconstruction with a Gaussian Dictionary.
1. Cover image - p. i 2. Table of Contents - p. iii 3. Series Page - p. iii 4. Copyright - p. iii 5. Preface - p. iii 6. Author's preface - p. xiii 7. Chapter One: Early life - p. 1 8. Chapter Two: SEM/ion beam system for examining ion etched surfaces - p. 9 9. Chapter Three: SEM examination of ion-etched metal and semiconductor crystals - p. 27 10. Chapter Four: Microfabrication in an SEM - p. 59 11. Chapter Five: My move to IBM and research on long-life cathodes - p. 71 12. Chapter Six: LaB6 cathode high-resolution electron probe and its application to microfabrication and surface microscopy - p. 93 13. Chapter Seven: Illumination systems and cathodes for electron probes and the design of a short focal length final lens electron probe - p. 133 14. Chapter Eight: Performance of the high resolution short focal length final lens electron probe and low-loss surface scanning electron microscopy - p. 167 15. Chapter Nine: Microfabrication in the STEM - p. 197 16. Chapter Ten: Nano-devices fabricated with the short focal length electron probe - p. 237 17. Chapter Eleven: Semiconductor lithography and processing in the 1980s and 1990s - p. 267 18. Chapter Twelve: Nanolithography at 350 kV - p. 303 19. Chapter Thirteen: Nanolithography for modulation doped field effect transistors - p. 345 20. Epilogue - p. 371 21. Index - p. 378
Nanolithography and Surface Microscopy with Electron Beams, Volume 231 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Specific chapters cover Introduction to inverse problems in electron microscopy, Directional sinogram inpainting for limited angle tomography, Strain tomography of crystals, FISTA with adaptive discretization, Total variation discretization, and Reconstruction with a Gaussian Dictionary.
1. Cover image - p. i 2. Table of Contents - p. iii 3. Series Page - p. iii 4. Copyright - p. iii 5. Preface - p. iii 6. Author's preface - p. xiii 7. Chapter One: Early life - p. 1 8. Chapter Two: SEM/ion beam system for examining ion etched surfaces - p. 9 9. Chapter Three: SEM examination of ion-etched metal and semiconductor crystals - p. 27 10. Chapter Four: Microfabrication in an SEM - p. 59 11. Chapter Five: My move to IBM and research on long-life cathodes - p. 71 12. Chapter Six: LaB6 cathode high-resolution electron probe and its application to microfabrication and surface microscopy - p. 93 13. Chapter Seven: Illumination systems and cathodes for electron probes and the design of a short focal length final lens electron probe - p. 133 14. Chapter Eight: Performance of the high resolution short focal length final lens electron probe and low-loss surface scanning electron microscopy - p. 167 15. Chapter Nine: Microfabrication in the STEM - p. 197 16. Chapter Ten: Nano-devices fabricated with the short focal length electron probe - p. 237 17. Chapter Eleven: Semiconductor lithography and processing in the 1980s and 1990s - p. 267 18. Chapter Twelve: Nanolithography at 350 kV - p. 303 19. Chapter Thirteen: Nanolithography for modulation doped field effect transistors - p. 345 20. Epilogue - p. 371 21. Index - p. 378
