Advances in Imaging and Electron Physics, Volume 213, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.
1. Cover image - p. i 2. Title page - p. ii 3. Table of Contents - p. iii 4. Copyright - p. iv 5. Contributors - p. ix 6. Preface - p. xi 7. Part One: Quantum degeneracy - p. xii 8. Chapter One: Partially coherent quantum degenerate electron matter waves - p. 3 9. Part Two: The contribution of atom probe tomography to the correlation of the optical and structural properties of semiconductor nanostructures - p. 26 10. Chapter Two: Laser-assisted atom probe tomography - p. 29 11. Chapter Three: Inaccuracies in atom probe measurements of semiconductor composition - p. 55 12. Chapter Four: Atom probe-based correlative microscopy - p. 89 13. Chapter Five: In-situ optical spectroscopy within an atom probe - p. 125 14. Part Three: CPO proceedings papers - p. 142 15. Chapter Six: Derivation, cross-validation, and comparison of analytic formulas for electrostatic deflector aberrations - p. 145 16. Chapter Seven: Analysis and fringe field scaling of a legacy set of electrostatic deflector aberration formulas - p. 205 17. Part Four: Advances in optical electron microscopy - p. 224 18. Chapter Eight: Scanning optical microscopy - p. 227 19. Index - p. 327
Advances in Imaging and Electron Physics, Volume 213, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.
1. Cover image - p. i 2. Title page - p. ii 3. Table of Contents - p. iii 4. Copyright - p. iv 5. Contributors - p. ix 6. Preface - p. xi 7. Part One: Quantum degeneracy - p. xii 8. Chapter One: Partially coherent quantum degenerate electron matter waves - p. 3 9. Part Two: The contribution of atom probe tomography to the correlation of the optical and structural properties of semiconductor nanostructures - p. 26 10. Chapter Two: Laser-assisted atom probe tomography - p. 29 11. Chapter Three: Inaccuracies in atom probe measurements of semiconductor composition - p. 55 12. Chapter Four: Atom probe-based correlative microscopy - p. 89 13. Chapter Five: In-situ optical spectroscopy within an atom probe - p. 125 14. Part Three: CPO proceedings papers - p. 142 15. Chapter Six: Derivation, cross-validation, and comparison of analytic formulas for electrostatic deflector aberrations - p. 145 16. Chapter Seven: Analysis and fringe field scaling of a legacy set of electrostatic deflector aberration formulas - p. 205 17. Part Four: Advances in optical electron microscopy - p. 224 18. Chapter Eight: Scanning optical microscopy - p. 227 19. Index - p. 327
