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Foundations of Molecular-Flow Networks for Vacuum System Analysis is the only book that covers desorption, adsorption and outgassing in relation to molecular-flow networks. It will be beneficial for academics, students and industry personnel working in the field of ultra-high vacuums for designing the equipment/set-up and as a guide to understand the processes relating to vacuums. The book is fully supported with equations and case studies from industry. Vacuum technology is extensively used in large synchrotrons and other large accelerators, as well as in many other smaller industrial and scientific facilities. Hence, this book is a welcome addition to the literature.

  • Explains how to design, model and simulate vacuum systems to obtain satisfactory pressure distributions
  • Offers a practical description of molecular flow, providing techniques to design molecular flow networks of vacuum systems and processes
  • Explores equivalence with electrical components to help readers with simulation using free software such as LTSPICE

1. Cover image - p. i 2. Title page - p. ii 3. Table of Contents - p. iii 4. Copyright - p. iv 5. Biography - p. xiii 6. Preface - p. xv 7. Acknowledgments - p. xix 8. Part I. Molecular-flow networks - p. xix 9. 1. Physical basis of molecular-flow networks: adsorption, desorption, diffusion, and outgassing/pumping - p. 3 10. 2. Applications of the resistor-network simulation method to complicated ultrahigh vacuum systems - p. 43 11. Part II. Vacuum technology necessary for designing molecular-flow networks - p. 101 12. 1. Methods for measuring outgassing rates - p. 105 13. Key-point - p. 105 14. Keywords - p. 113 15. [1-1]. “Measurement of outgassing rates from materials by the differential pressure rise method” (N. Yoshimura, H. Oikawa, and O. Mikami, 1970) - p. 105 16. [1-2]. “A three-point-pressure method for measuring the gas-flow rate through a conducting pipe” (H. Hirano and N. Yoshimura, 1986) - p. 107 17. [1-3]. “Two-point pressure method for measuring the outgassing rate” (N. Yoshimura and H. Hirano, 1989)[1-3] - p. 126 18. [1-4]. “Discussion on methods for measuring the outgassing rate” (N. Yoshimura, 1990) - p. 137 19. 2. Molecular-flow conductance - p. 139 20. 3. Total and partial pressure gauges for ultrahigh-vacuum use - p. 153 21. Index - p. 185

Descripcion
Descripción

Foundations of Molecular-Flow Networks for Vacuum System Analysis is the only book that covers desorption, adsorption and outgassing in relation to molecular-flow networks. It will be beneficial for academics, students and industry personnel working in the field of ultra-high vacuums for designing the equipment/set-up and as a guide to understand the processes relating to vacuums. The book is fully supported with equations and case studies from industry. Vacuum technology is extensively used in large synchrotrons and other large accelerators, as well as in many other smaller industrial and scientific facilities. Hence, this book is a welcome addition to the literature.

  • Explains how to design, model and simulate vacuum systems to obtain satisfactory pressure distributions
  • Offers a practical description of molecular flow, providing techniques to design molecular flow networks of vacuum systems and processes
  • Explores equivalence with electrical components to help readers with simulation using free software such as LTSPICE

1. Cover image - p. i 2. Title page - p. ii 3. Table of Contents - p. iii 4. Copyright - p. iv 5. Biography - p. xiii 6. Preface - p. xv 7. Acknowledgments - p. xix 8. Part I. Molecular-flow networks - p. xix 9. 1. Physical basis of molecular-flow networks: adsorption, desorption, diffusion, and outgassing/pumping - p. 3 10. 2. Applications of the resistor-network simulation method to complicated ultrahigh vacuum systems - p. 43 11. Part II. Vacuum technology necessary for designing molecular-flow networks - p. 101 12. 1. Methods for measuring outgassing rates - p. 105 13. Key-point - p. 105 14. Keywords - p. 113 15. [1-1]. “Measurement of outgassing rates from materials by the differential pressure rise method” (N. Yoshimura, H. Oikawa, and O. Mikami, 1970) - p. 105 16. [1-2]. “A three-point-pressure method for measuring the gas-flow rate through a conducting pipe” (H. Hirano and N. Yoshimura, 1986) - p. 107 17. [1-3]. “Two-point pressure method for measuring the outgassing rate” (N. Yoshimura and H. Hirano, 1989)[1-3] - p. 126 18. [1-4]. “Discussion on methods for measuring the outgassing rate” (N. Yoshimura, 1990) - p. 137 19. 2. Molecular-flow conductance - p. 139 20. 3. Total and partial pressure gauges for ultrahigh-vacuum use - p. 153 21. Index - p. 185

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Ficha Técnica