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Coulomb Interactions in Particle Beams, Volume 223 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and computing methods used in all these domains, with this release exploring Coulomb Interactions in Particle Beams.

  • Provides the authority and expertise of leading contributors from an international board of authors
  • Presents the latest release in the Advances in Imaging and Electron Physics series
  • Updated release includes the latest information on Coulomb Interactions in Particle Beams

1. Chapter One: Introduction - p. 1 2. Chapter Two: Definitions, notation, and methods of analysis - p. 3 3. Abstract - p. 3 4. 1 Equations of motion - p. 12 5. 2 Cardinal elements - p. 9 6. 3 Aberration coefficients: Round lenses - p. 24 7. 4 Fifth-order aberrations - p. 73 8. References - p. 78 9. Chapter Three: Quadrupole potential functions - p. 79 10. Chapter Four: Quadrupole systems: Their suitability for specific tasks - p. 93 11. Chapter Five: Quadrupole data - p. 120 12. Abstract - p. 120 13. 1 The single quadrupole - p. 120 14. 2 The quadrupole doublet - p. 296 15. 3 The quadrupole triplet - p. 295 16. 4 The quadrupole quadruplet - p. 313 17. 5 The symmetric quadruplet - p. 312 18. 6 The antisymmetric quadruplet - p. 312 19. 7 Other systems - p. 336 20. 8 Octopoles - p. 347 21. References - p. 361 22. Appendix I: Nomenclature and Notation - p. 363 23. Appendix II: The shadow projection method of measuring aberration coefficients - p. 367 24. References - p. 371 25. Author index - p. 371 26. Subject index - p. 371

Descripcion
Descripción

Coulomb Interactions in Particle Beams, Volume 223 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and computing methods used in all these domains, with this release exploring Coulomb Interactions in Particle Beams.

  • Provides the authority and expertise of leading contributors from an international board of authors
  • Presents the latest release in the Advances in Imaging and Electron Physics series
  • Updated release includes the latest information on Coulomb Interactions in Particle Beams

1. Chapter One: Introduction - p. 1 2. Chapter Two: Definitions, notation, and methods of analysis - p. 3 3. Abstract - p. 3 4. 1 Equations of motion - p. 12 5. 2 Cardinal elements - p. 9 6. 3 Aberration coefficients: Round lenses - p. 24 7. 4 Fifth-order aberrations - p. 73 8. References - p. 78 9. Chapter Three: Quadrupole potential functions - p. 79 10. Chapter Four: Quadrupole systems: Their suitability for specific tasks - p. 93 11. Chapter Five: Quadrupole data - p. 120 12. Abstract - p. 120 13. 1 The single quadrupole - p. 120 14. 2 The quadrupole doublet - p. 296 15. 3 The quadrupole triplet - p. 295 16. 4 The quadrupole quadruplet - p. 313 17. 5 The symmetric quadruplet - p. 312 18. 6 The antisymmetric quadruplet - p. 312 19. 7 Other systems - p. 336 20. 8 Octopoles - p. 347 21. References - p. 361 22. Appendix I: Nomenclature and Notation - p. 363 23. Appendix II: The shadow projection method of measuring aberration coefficients - p. 367 24. References - p. 371 25. Author index - p. 371 26. Subject index - p. 371

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