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Descripción

Semiconductors and Semimetals series, highlights new advances in the field, with this new volume presenting interesting chapters. Each chapter is written by an international board of authors.

  • 2019 marks the year that nitride ferroelectrics were reported, and the indicators and mechanisms used for oxide ferroelectricity appear inadequate
  • The emergence of nitride ferroelectrics has opened new frontiers in ferroelectric materials research and ferroelectric based technologies. This book is a direct consequence of this
  • Draws upon the collective knowledge and expertise of leading scientists and researchers in this field to provide a holistic view on the state of ferroelectric nitride research and applications

1. Cover image - p. i 2. Title page - p. ii 3. Table of Contents - p. iii 4. Series Page - p. iii 5. Copyright - p. iii 6. Contributors - p. iii 7. Preface - p. iii 8. Chapter One: Epitaxial ScAlN: Transistors through high ScN fraction thin films - p. 1 9. Chapter Two: Ferroelectric nitride semiconductors: Molecular beam epitaxy, properties, and emerging device applications - p. 21 10. Chapter Three: Structural and ferroelectric properties of Al1−xScxN - p. 71 11. Chapter Four: In-plane ferroelectric switching of non-polar wurtzite AlScN films using SAW resonators - p. 101 12. Chapter Five: Toward new ferroelectric nitride materials and devices: Aluminum boron nitride and aluminum scandium nitride ferroelectric high electron mobility transistors (FerroHEMTs) - p. 119 13. Chapter Six: Reliability of ferroelectric devices - p. 137 14. Index - p. 164

Descripcion
Descripción

Semiconductors and Semimetals series, highlights new advances in the field, with this new volume presenting interesting chapters. Each chapter is written by an international board of authors.

  • 2019 marks the year that nitride ferroelectrics were reported, and the indicators and mechanisms used for oxide ferroelectricity appear inadequate
  • The emergence of nitride ferroelectrics has opened new frontiers in ferroelectric materials research and ferroelectric based technologies. This book is a direct consequence of this
  • Draws upon the collective knowledge and expertise of leading scientists and researchers in this field to provide a holistic view on the state of ferroelectric nitride research and applications

1. Cover image - p. i 2. Title page - p. ii 3. Table of Contents - p. iii 4. Series Page - p. iii 5. Copyright - p. iii 6. Contributors - p. iii 7. Preface - p. iii 8. Chapter One: Epitaxial ScAlN: Transistors through high ScN fraction thin films - p. 1 9. Chapter Two: Ferroelectric nitride semiconductors: Molecular beam epitaxy, properties, and emerging device applications - p. 21 10. Chapter Three: Structural and ferroelectric properties of Al1−xScxN - p. 71 11. Chapter Four: In-plane ferroelectric switching of non-polar wurtzite AlScN films using SAW resonators - p. 101 12. Chapter Five: Toward new ferroelectric nitride materials and devices: Aluminum boron nitride and aluminum scandium nitride ferroelectric high electron mobility transistors (FerroHEMTs) - p. 119 13. Chapter Six: Reliability of ferroelectric devices - p. 137 14. Index - p. 164

Indice
Autores
Muestra
Ficha Técnica