Volume one of Principles of Electron Optics: Basic Geometrical Optics, Second Edition, explores the geometrical optics needed to analyze an extremely wide range of instruments: cathode-ray tubes; the family of electron microscopes, including the fixed-beam and scanning transmission instruments, the scanning electron microscope and the emission microscope; electron spectrometers and mass spectrograph; image converters; electron interferometers and diffraction devices; electron welding machines; and electron-beam lithography devices.
The book provides a self-contained, detailed, modern account of electron optics for anyone involved with particle beams of modest current density in the energy range up to a few mega-electronvolts. You will find all the basic equations with their derivations, recent ideas concerning aberration studies, extensive discussion of the numerical methods needed to calculate the properties of specific systems and guidance to the literature of all the topics covered. A continuation of these topics can be found in volume two, Principles of Electron Optics: Applied Geometrical Optics.
The book is intended for postgraduate students and teachers in physics and electron optics, as well as researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy and nanolithography.
1. Chapter 1. Introduction - p. 1 2. Part I: Classical Mechanics - p. 12 3. Chapter 2. Relativistic Kinematics - p. 15 4. Chapter 3. Different Forms of Trajectory Equations - p. 25 5. Chapter 4. Variational Principles - p. 33 6. Chapter 5. Hamiltonian Optics - p. 45 7. Part II: Calculation of Static Fields - p. 61 8. Chapter 6. Basic Concepts and Equations - p. 65 9. Chapter 7. Series Expansions - p. 77 10. Abstract - p. 77 11. 7.1 Azimuthal Fourier Series Expansions - p. 77 12. 7.2 Radial Series Expansions - p. 82 13. 7.3 Rotationally Symmetric Fields - p. 92 14. 7.4 Multipole Fields - p. 95 15. 7.5 Planar Fields - p. 97 16. 7.6 Fourier–Bessel Series Expansions - p. 98 17. Chapter 8. Boundary-Value Problems - p. 101 18. Chapter 9. Integral Equations - p. 115 19. Chapter 10. The Boundary-Element Method - p. 133 20. Chapter 11. The Finite-Difference Method (FDM) - p. 167 21. Chapter 12. The Finite-Element Method (FEM) - p. 185 22. Chapter 13. Field-Interpolation Techniques - p. 209 23. Part III: The Paraxial Approximation - p. 220 24. Chapter 14. Introduction to Paraxial Equations - p. 223 25. Chapter 15. Systems with an Axis of Rotational Symmetry - p. 225 26. Chapter 16. Gaussian Optics of Rotationally Symmetric Systems: Asymptotic Image Formation - p. 247 27. Chapter 17. Gaussian Optics of Rotationally Symmetric Systems: Real Cardinal Elements - p. 263 28. Chapter 18. Electron Mirrors - p. 281 29. Chapter 19. Quadrupole Lenses - p. 297 30. Chapter 20. Cylindrical Lenses - p. 311 31. Part IV: Aberrations - p. 314 32. Chapter 21. Introduction to Aberration Theory - p. 317 33. Chapter 22. Perturbation Theory: General Formalism - p. 323 34. Chapter 23. The Relation Between Permitted Types of Aberration and System Symmetry - p. 335 35. Abstract - p. 335 36. 23.1 Introduction - p. 335 37. 23.2 N=1 - p. 342 38. 23.3 N=2 - p. 345 39. 23.4 N=3 - p. 348 40. 23.5 N=4 - p. 350 41. 23.6 N=5 and 6 - p. 352 42. 23.7 Systems with an Axis of Rotational Symmetry - p. 353 43. 23.8 Note on the Classification of Aberrations - p. 356 44. Chapter 24. The Geometrical Aberrations of Round Lenses - p. 359 45. Abstract - p. 359 46. 24.1 Introduction - p. 359 47. 24.2 Derivation of the Real Aberration Coefficients - p. 359 48. 24.3 Spherical Aberration (Terms in xa and ya only) - p. 371 49. 24.4 Coma (Terms Linear in xo, yo) - p. 386 50. 24.5 Astigmatism and Field Curvature (Terms Linear in xa, ya) - p. 390 51. 24.6 Distortion (Terms in xo and yo only) - p. 399 52. 24.7 The Variation of the Aberration Coefficients with Aperture Position - p. 402 53. 24.8 Reduced Coordinates - p. 405 54. 24.9 Seman’s Transformation of the Characteristic Function - p. 407 55. 24.10 Fifth-Order Aberrations - p. 413 56. Chapter 25. Asymptotic Aberration Coefficients - p. 425 57. Chapter 26. Chromatic Aberrations - p. 443 58. Chapter 27. Aberration Matrices and the Aberrations of Lens Combinations - p. 463 59. Chapter 28. The Aberrations of Mirrors and Cathode Lenses - p. 471 60. Chapter 29. The Aberrations of Quadrupole Lenses and Octopoles - p. 485 61. Abstract - p. 485 62. 29.1 Introduction - p. 485 63. 29.2 Geometrical Aberration Coefficients - p. 485 64. 29.3 Aperture Aberrations - p. 504 65. 29.4 Chromatic Aberrations - p. 510 66. 29.5 Quadrupole Multiplets - p. 513 67. Chapter 30. The Aberrations of Cylindrical Lenses - p. 517 68. Chapter 31. Parasitic Aberrations - p. 521 69. Part V: Deflection Systems - p. 543 70. Chapter 32. Paraxial Properties of Deflection Systems - p. 547 71. Chapter 33. The Aberrations of Deflection Systems - p. 561 72. Part VI: Computer-Aided Electron Optics - p. 581 73. Chapter 34. Numerical Calculation of Trajectories, Paraxial Properties and Aberrations - p. 585 74. Abstract - p. 585 75. 34.1 Introduction - p. 585 76. 34.2 Numerical Solution of Ordinary Differential Equations - p. 586 77. 34.3 Standard Applications in Electron Optics - p. 591 78. 34.4 Differential Equations for the Aberrations - p. 593 79. 34.5 Least-Squares-Fit Methods in Electron Optics - p. 598 80. 34.6 Determination and Evaluation of Aberration Discs - p. 603 81. 34.7 Optimization Procedures - p. 613 82. 34.8 Differential Algebra - p. 619 83. 34.9 The Use of Computer Algebra Languages - p. 623 84. Notes and References - p. 627 85. Preface and Chapter 1 - p. 627 86. Part I, Chapters 2–5 - p. 638 87. Part II, Chapters 6–13 - p. 640 88. Part III, Chapters 14–20 - p. 648 89. Part IV, Chapters 21–31 - p. 658 90. Part V, Chapters 32 and 33 - p. 679 91. Part VI, Chapter 34 - p. 684 92. Conference Proceedings - p. 690 93. Index - p. 701
Volume one of Principles of Electron Optics: Basic Geometrical Optics, Second Edition, explores the geometrical optics needed to analyze an extremely wide range of instruments: cathode-ray tubes; the family of electron microscopes, including the fixed-beam and scanning transmission instruments, the scanning electron microscope and the emission microscope; electron spectrometers and mass spectrograph; image converters; electron interferometers and diffraction devices; electron welding machines; and electron-beam lithography devices.
The book provides a self-contained, detailed, modern account of electron optics for anyone involved with particle beams of modest current density in the energy range up to a few mega-electronvolts. You will find all the basic equations with their derivations, recent ideas concerning aberration studies, extensive discussion of the numerical methods needed to calculate the properties of specific systems and guidance to the literature of all the topics covered. A continuation of these topics can be found in volume two, Principles of Electron Optics: Applied Geometrical Optics.
The book is intended for postgraduate students and teachers in physics and electron optics, as well as researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy and nanolithography.
1. Chapter 1. Introduction - p. 1 2. Part I: Classical Mechanics - p. 12 3. Chapter 2. Relativistic Kinematics - p. 15 4. Chapter 3. Different Forms of Trajectory Equations - p. 25 5. Chapter 4. Variational Principles - p. 33 6. Chapter 5. Hamiltonian Optics - p. 45 7. Part II: Calculation of Static Fields - p. 61 8. Chapter 6. Basic Concepts and Equations - p. 65 9. Chapter 7. Series Expansions - p. 77 10. Abstract - p. 77 11. 7.1 Azimuthal Fourier Series Expansions - p. 77 12. 7.2 Radial Series Expansions - p. 82 13. 7.3 Rotationally Symmetric Fields - p. 92 14. 7.4 Multipole Fields - p. 95 15. 7.5 Planar Fields - p. 97 16. 7.6 Fourier–Bessel Series Expansions - p. 98 17. Chapter 8. Boundary-Value Problems - p. 101 18. Chapter 9. Integral Equations - p. 115 19. Chapter 10. The Boundary-Element Method - p. 133 20. Chapter 11. The Finite-Difference Method (FDM) - p. 167 21. Chapter 12. The Finite-Element Method (FEM) - p. 185 22. Chapter 13. Field-Interpolation Techniques - p. 209 23. Part III: The Paraxial Approximation - p. 220 24. Chapter 14. Introduction to Paraxial Equations - p. 223 25. Chapter 15. Systems with an Axis of Rotational Symmetry - p. 225 26. Chapter 16. Gaussian Optics of Rotationally Symmetric Systems: Asymptotic Image Formation - p. 247 27. Chapter 17. Gaussian Optics of Rotationally Symmetric Systems: Real Cardinal Elements - p. 263 28. Chapter 18. Electron Mirrors - p. 281 29. Chapter 19. Quadrupole Lenses - p. 297 30. Chapter 20. Cylindrical Lenses - p. 311 31. Part IV: Aberrations - p. 314 32. Chapter 21. Introduction to Aberration Theory - p. 317 33. Chapter 22. Perturbation Theory: General Formalism - p. 323 34. Chapter 23. The Relation Between Permitted Types of Aberration and System Symmetry - p. 335 35. Abstract - p. 335 36. 23.1 Introduction - p. 335 37. 23.2 N=1 - p. 342 38. 23.3 N=2 - p. 345 39. 23.4 N=3 - p. 348 40. 23.5 N=4 - p. 350 41. 23.6 N=5 and 6 - p. 352 42. 23.7 Systems with an Axis of Rotational Symmetry - p. 353 43. 23.8 Note on the Classification of Aberrations - p. 356 44. Chapter 24. The Geometrical Aberrations of Round Lenses - p. 359 45. Abstract - p. 359 46. 24.1 Introduction - p. 359 47. 24.2 Derivation of the Real Aberration Coefficients - p. 359 48. 24.3 Spherical Aberration (Terms in xa and ya only) - p. 371 49. 24.4 Coma (Terms Linear in xo, yo) - p. 386 50. 24.5 Astigmatism and Field Curvature (Terms Linear in xa, ya) - p. 390 51. 24.6 Distortion (Terms in xo and yo only) - p. 399 52. 24.7 The Variation of the Aberration Coefficients with Aperture Position - p. 402 53. 24.8 Reduced Coordinates - p. 405 54. 24.9 Seman’s Transformation of the Characteristic Function - p. 407 55. 24.10 Fifth-Order Aberrations - p. 413 56. Chapter 25. Asymptotic Aberration Coefficients - p. 425 57. Chapter 26. Chromatic Aberrations - p. 443 58. Chapter 27. Aberration Matrices and the Aberrations of Lens Combinations - p. 463 59. Chapter 28. The Aberrations of Mirrors and Cathode Lenses - p. 471 60. Chapter 29. The Aberrations of Quadrupole Lenses and Octopoles - p. 485 61. Abstract - p. 485 62. 29.1 Introduction - p. 485 63. 29.2 Geometrical Aberration Coefficients - p. 485 64. 29.3 Aperture Aberrations - p. 504 65. 29.4 Chromatic Aberrations - p. 510 66. 29.5 Quadrupole Multiplets - p. 513 67. Chapter 30. The Aberrations of Cylindrical Lenses - p. 517 68. Chapter 31. Parasitic Aberrations - p. 521 69. Part V: Deflection Systems - p. 543 70. Chapter 32. Paraxial Properties of Deflection Systems - p. 547 71. Chapter 33. The Aberrations of Deflection Systems - p. 561 72. Part VI: Computer-Aided Electron Optics - p. 581 73. Chapter 34. Numerical Calculation of Trajectories, Paraxial Properties and Aberrations - p. 585 74. Abstract - p. 585 75. 34.1 Introduction - p. 585 76. 34.2 Numerical Solution of Ordinary Differential Equations - p. 586 77. 34.3 Standard Applications in Electron Optics - p. 591 78. 34.4 Differential Equations for the Aberrations - p. 593 79. 34.5 Least-Squares-Fit Methods in Electron Optics - p. 598 80. 34.6 Determination and Evaluation of Aberration Discs - p. 603 81. 34.7 Optimization Procedures - p. 613 82. 34.8 Differential Algebra - p. 619 83. 34.9 The Use of Computer Algebra Languages - p. 623 84. Notes and References - p. 627 85. Preface and Chapter 1 - p. 627 86. Part I, Chapters 2–5 - p. 638 87. Part II, Chapters 6–13 - p. 640 88. Part III, Chapters 14–20 - p. 648 89. Part IV, Chapters 21–31 - p. 658 90. Part V, Chapters 32 and 33 - p. 679 91. Part VI, Chapter 34 - p. 684 92. Conference Proceedings - p. 690 93. Index - p. 701
